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IMAGINE: A secure supply of CVD precursors

A secure supply of CVD precursorsAs the semiconductor industry broadened the use of copper interconnects, chemical vapor deposition (CVD) precursors are addressing new challenges, such as preventing copper diffusion through the silicon substrate or achieving thin films with low dielectric constants.

For decades, we have provided a secure, high-quality supply of silicon-based CVD precursors for the global wafer fabrication industry. From chlorosilanes, methylsilanes and, monosilanes, we bring our long-standing expertise in producing and handling these critical materials to ensure you receive a dependable, safe, high-purity supply.

Our broad portfolio of specialty gas precursors target production of silicon, silicon dioxide, silicon carbide, silicon oxycarbide and silicon nitride films. More importantly, their versatile chemistry offers solutions across a number of demanding applications, such as processes that require low-temperature deposition of thin films, high-ĸ or low-ĸ dielectric constants or filling gaps with high aspect ratios.

More than a world-class materials supplier, Dow Corning is an expert and dedicated collaborator. If our product finder cannot identify an off-the-shelf solution that meets your precise specifications, or if you are looking for application expertise and support please contact us.

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