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IMAGINE: Proven materials for advanced lithography

For decades, the semiconductor industry has steadily advanced from one technology node to the next, walking the very thin line between innovative new ideas and time-tested solutions.

Dow Corning® is a trusted innovator of advanced lithography materials. We continue our industry-leading innovation today with negative acting E-beam resists specifically formulated to directly write the finest patterns with high resolution. Available for spin coating to a range of thin film thicknesses from 30 to 180 nm, these high-purity materials deliver excellent line edge roughness for features down to 6 nm.

As a leading supplier of silicones for more than seven decades, Dow Corning has an established record for delivering targeted properties consistently, with batch-to-batch reproducibility and backed by certified data and 24/7 global technical support. Count on us for a host of analytical and technical services ranging from material qualification and testing through manufacturing start-up and equipment recommendations. Our extensive knowledge of materials and processes can often translate into manufacturing and process efficiencies for you.

More than a world-class materials supplier, Dow Corning is an expert and dedicated collaborator. If our product finder cannot identify an off-the shelf solution that meets your precise specifications, or if you are looking for application expertise and support please contact us.

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E-beam resists
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Dow Corning®
XR-1541 E-Beam Resist
Directly write the finest patterns
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