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Solve your most difficult challenges now and tomorrow. Dow Corning is
committed to develop and commercialize new molecules for all your
next-generation, thin-film deposition needs.
Your benefits with Dow Corning:
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Develop the most challenging aspect ratios
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Reduce your thermal budgets
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Meet your electrical properties and mechanical property
requirements
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Benefit from 60 years of silicon material and technical support
expertise
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Get innovative solutions for your current and future challenges
Our expertise at your service:
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Get both spin-on and CVD low-ĸ (<3) dielectric materials
for IC fabrication from a leading and reliable supplier
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100% vertical integration from starting materials (sand) to
semiconductor-grade silicon-based gases and chemicals
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Basic materials research and development, with pilot sampling
through large-scale chemical production performed throughout a globally
integrated organization
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Numerous tier-one customer audits successfully completed
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A leading producer of specialty chemicals: organosilanes, siloxanes,
silicon-based resins and polymers
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For additional information on chemical vapor deposition, as well as
processing solutions, see:
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| Type: Multifunctional CVD precursor |
| Physical Form: Silicon source specialty gas/liquid |
| Typical Molecules: Z3MSTM, Z4MSTM, ZTOMCATSTM, Z2DMTM, organosilanes, organosiloxanes, others |
| Special Properties: High purity; semiconductor grade |
| Typical Molecules: ZHCDS (hexachlorodisilane), chlorosilanes, others |
| Potential Uses: Formation of front end-of-line low-temperature deposition of thin films (i.e., silicon oxide, silicon nitride, epitaxial silicon, poly silicon, etc.); typical applications include spacer nitrides, spacer oxides, etch stop, cap nitride, STI liner, engineered source/drain and engineered substrates |
| Technical
Data |
Download Data Sheet
PDF | Tutorial |
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| Type: Multifunctional CVD precursors |
| Physical Form: Silicon source specialty liquid |
| Typical Molecules: ZHCDS (hexachlorodisilane), chlorosilanes, others |
| Special Properties: Highly reactive molecules; high purity; semiconductor grade |
| Potential Uses: Formation of front end-of-line low-temperature deposition of thin films (i.e., silicon oxide, silicon nitride, epitaxial silicon, poly silicon, etc.); typical applications include spacer nitrides, spacer oxides, etch stop, cap nitride, STI liner, engineered source/drain and engineered substrates |
| Technical
Data |
Download Data Sheet
PDF | Tutorial |
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| Type: Multifunctional CVD precursors |
| Physical Form: Silicon source specialty liquid |
| Typical Molecules: Aminosilanes, chlorosilanes, others |
| Special Properties: High purity; semiconductor grade |
| Potential Uses: Formation of silicon oxide or metal silicates; typical applications include logic gate oxide and memory capacitor oxide |
| Technical
Data |
Download Data Sheet
PDF | Tutorial |
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| Type: Multifunctional CVD precursor |
| Physical Form: Silicon source specialty liquid |
| Typical Molecules: Organosilanes, organosiloxanes, others |
| Special Properties: High purity; semiconductor grade |
| Potential Uses: Formation of silicon oxide thin-film dielectrics; typical film applications include shallow trench isolation (STI) and pre-metal dielectric (PMD) gapfill |
| Technical
Data |
Download Data Sheet
PDF | Tutorial |
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PDF Links will download files in Adobe Acrobat PDF format. For technical
information, or to download the free Acrobat Reader, go to Acrobat help.
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