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Chemical Vapor Deposition


Low-Temperature Applications


Dow Corning® Brand ProductDescriptionFeatures
ZHCDS CVD PrecursorA silicon source specialty liquid engineered for LPCVD, APCVD and ALD processes used to deposit thin-film dielectricsCompatible with standard LPCVD equipment and standard liquid delivery systems, nonpyrophoric
ChlorosilanesSilicon source specialty materials engineered for LPCVD, APCVD and ALD processes used to deposit thin-film dielectricsCompatible with standard thermal deposition equipment and standard liquid delivery systems, nonpyrophoric

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Technical Data

Download Chemical Vapor Deposition Family Data Sheet (PDF size = 355 KB)

Tutorial

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