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Chemical Vapor Deposition


High-к Applications


Dow Corning® Brand ProductDescriptionFeatures
AminosilanesSilicon source specialty materials engineered for LPCVD, APCVD and ALD processes used to deposit thin-film dielectricsCompatible with standard thermal deposition equipment and standard liquid delivery systems, nonpyrophoric

PDF Links will download files in Adobe Acrobat PDF format. For technical information, or to download the free Acrobat Reader, go to Acrobat help.

Technical Data

Download Chemical Vapor Deposition Family Data Sheet (PDF size = 355 KB)

Tutorial

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