Chemical Vapor Deposition

Dow Corning® Z3MS™ CVD Dielectric is a silicone source specialty gas engineered for PECVD processes used to deposit thin-film dielectrics.

Typical thin-film dielectrics formed are:

• Silicon-carbide (a-SiC:H)
• Silicon-oxycarbide (a-SiOC:H)
• Silicon-nitride (a-SiCN:H)

Dow Corning® Z3MS™ CVD Dielectric offers:

• Multifunctional CVD precursor
• Compatible with standard PECVD equipment
• Compatible with standard gas delivery systems
• Nonpyrophoric
• Environmentally friendly
• Not a global warmer; no ozone depleting byproducts resulting from trimethylsilane decomposition
• Low cost of ownership