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Chemical Vapor Deposition


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Precursors Already Commercialized
Product DesignationChemical NameUseful in Forming
Dow Corning® Z3MS™ CVD PrecursorTrimethylsilane

Silicon Carbide
Silicon Oxycarbide
Silicon Nitride
Dow Corning® Z4MS™ CVD Precursor  Tetramethylsilane

Silicon Carbide
Silicon Oxycarbide
Silicon Nitride
Dow Corning® ZTOMCATS™ CVD Precursor Tetramethylcyclotetrasiloxane  Silicon Oxycarbide
Dow Corning® ZTOMCATS™ CVD PrecursorOctamethylcyclotetrasiloxaneSilicon Oxycarbide
Dow Corning® ZHCDS CVD PrecursorHexachlorodisilaneSilicon Nitride
Dow Corning® Z2DM™ CVD PrecursorDimethyldimethoxysilaneSilicon Oxycarbide
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< back to Chemical Vapor Deposition Home Page  
 
  1. Chemical Vapor Deposition Tutorial


  2. Basics of CVD


  3. CVD Variants


  4. Various Uses of CVD Layers


  5. Benefits of Various Composition Coatings


  6. Precursors Already Commercialized


  7. Drawbacks of Traditional Silicon Source Materials


  8. More Benefits of Working with Dow Corning
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