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Chemical Vapor Deposition


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Drawbacks of Traditional Silicon Source Materials

Silane

One of the main concerns in using Silane gas, SiH4, is safety. It is an unstable, pyrophoric material and burns or explodes in contact with ambient air. This means that many extra precautions must be taken for processing and equipment, such as double-wall vessels. Additionally, silane is a toxic material.

TEOS

Silicon dioxide films grown from TEOS often have higher dielectric constant (ΔΈ) values than desired at 3.6 to 4.0. Films also have uneven growth rates over features, and the higher growth on the corners of steps can result in voids or keyholes between conducting lines for some gap widths. Also, the liquid delivery systems for this material can be difficult.

Keyhole Illustration

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< back to Chemical Vapor Deposition Home Page  
 
  1. Chemical Vapor Deposition Tutorial


  2. Basics of CVD


  3. CVD Variants


  4. Various Uses of CVD Layers


  5. Benefits of Various Composition Coatings


  6. Precursors Already Commercialized


  7. Drawbacks of Traditional Silicon Source Materials


  8. More Benefits of Working with Dow Corning


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