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Analytical Capability
Dow Corning has nearly 60 years of practical experience in analyzing every
aspect of silicon-based materials. Its labs have been ISO-9001 certified since
1997. We can help with items such as structural analysis, chromatography,
impurity identification and measurement of physical properties.
CVD Research and Development
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200-mm PECVD dielectric thin-film growth
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13.56 MHz PlasmaTherm 790 System, RIE, PE and triode plasma modules,
30-7000 mT, 50-550ºC (Class 1000)
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Room-temperature HDP PECVD system (Q4-2002)
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Real-time plasma analysis by mass spectroscopy
Electrical Testing
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Sputtered metal gate C-V analysis 10 mHz-20 MHz, quasistatic C-V
analysis
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Leakage and breakdown testing to 1000 VDC
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Bias temperature stress (BTS) and triangular voltage sweep (TVS) mobile ion
testing
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TDDB and QDB reliability testing
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Inert ambient hot chuck probe stations, 100-200 mm to 300ºC wafer
temperature
Thin Film Characterization
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Multichannel spectroscopic ellipsometry with wafer mapping, 190-1000 nm
wavelength, 300-mm wafer capability (3 systems)
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FT-IR wafer mapping with compositional analysis
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UV-Vis spectroscopy
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200-mm wafer RTP-based thermal desorption spectrometer
Mechanical Testing
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Wafer curvature/stress testing 20-450ºC
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AFM-based nano-identation testing
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In-situ temperature-humidity testing
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mELT, four-point bend and stud pull adhesion testing
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On-wafer particle analysis to 0.2-um particle size
Be sure to visit the Analytical Services website for more information on our
analytical capabilities.
Sample Prototypes
We utilize multiple lab-scale process lines to do custom synthesis and
purification of new materials for our customers. Pilot-scale facility for
synthesis and purification for many potential CVD precursors is under
development. We have designed this capability to provide customers with new
materials for their next-generation applications and to create a smooth
transition from samples to high-volume manufacturing.
Packaging to Semiconductor Standards
We have advanced facilities for packaging our products to ensure that they
arrive at your location with the same purity standards with which they were
created.
CVD Precursor Technology
As your partner in technology development, we offer synthesis, purification
and testing of silicon-based precursor materials for use in next-generation
low-ĸ, high-ĸ, gap fill and low-temperature CVD applications.
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