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Silicon Lithography


193 nm Antireflective Coatings


Dow Corning® brand antireflective resin solutions are for use as the silicon resin raw material for advanced 193 nm antireflective coating formulations. We are custom designing, developing and commercializing them to meet the unique needs of leading antireflective coating material suppliers.

Performance Properties:

  • Etch resistant
  • 30 - 40 or > 40 wt% silicon
  • Solution stability
  • Low temperature cure
  • Compatibility with photoresist
  • Reworkability
  • Controlled optical properties

Physical Form: Liquid solution of silicon resin in carrier solvent

Typical Resins: Customized silsesquioxane resins

Application Use: Silicon resin raw material for 193 nm antireflective coating formulations

Need a customized silicon resin for your advanced antireflection formulation?
Contact us to learn how we can help you develop next generation technology, today.

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