|
DOW
CORNING® XR-1541 E-beam Resists (PDF: 26 KB) are hydrogen
silsesquioxane resin solutions specifically formulated for research groups to
directly write the finest patterns.
They are negative acting resists available for spin coating to a range of
thin film thicknesses from 30 to 180 nm. Customized concentrations are
also available for thinner or thicker resists.
Performance Properties:
-
E-beam patternable
-
High resolution
-
Etch resistance
-
Thin films
Physical Form: Liquid solution of silicon resin in carrier
solvent
Resin: Hydrogen silsesquioxane resin
Application Use: E-beam negative resist
|
Change
