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Dow Corning Plasma's surface analysis capabilities and know-how are
available to help accelerate product development whether on your own pilot
facilities or through contract R&D. Our facilities include:
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Mocon OX-TRAN - oxygen permeability
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Mocon PERMA-TRAN - moisture permeability
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Video Contact Angle - surface energy measurements
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FT-IR with ATR - surface chemistry > 1 micron
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X-ray Photoelectron Spectroscopy (XPS) - surface chemistry < 10 nm
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Atomic Force Microscopy - surface morphology of filmic substrates
X-Ray Photoelectron Spectroscopy XPS is one of our most powerful
tools providing a rapid elemental and chemical identification service. Its
features include:
Features
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Analysis of outermost 10nm of surface for both insulating and conducting
samples
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Elemental identification and quantification of all elements except H and
He
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Chemical composition and oxidation state information possible
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Rapid, automated throughput, with expert interpretation and diagnosis
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Elemental mapping available using Imaging XPS
Its Instrumentation comprises:
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Axis Ultra System (Kratos Analytical Ltd, UK)
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High energy resolution
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Fast parallel imaging
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Small spot spectroscopy
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Equipped with monochromated Al and dual Mg/Zr X-ray sources
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Elevated and reduced temperature analysis
For more information on how Dow Corning Plasma Solutions can assist with
your analytical needs, please contact us.
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