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APPLD (atmospheric pressure plasma liquid deposition)
combines cool, atmospheric pressure plasma (energetic, ionized, glowing gas)
with liquid precursors to create thin-film functional coatings on most
materials. The liquid precursor is atomized into droplets and sprayed
directly into the plasma—a Dow Corning patented technique. Your
workpiece/substrate is immersed in the plasma which converts the precursor into
a coating that:
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Chemically bonds for
excellent adhesion to substrates
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Is highly polymerized and
crosslinked for toughness and durability
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Is ultra-thin with a
well-controlled thickness (from nm to microns) to leave bulk properties
unaffected
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Offers high performance,
retaining all of the original properties of the liquid precursor—even for large
and complex molecules, whereas most plasma processes destroy original precursor
properties. APPLD provides the ultimate in surface functionality and
performance, achievable by no other atmospheric pressure plasma
technology
With APPLD, you can open the door to new, highly functional
and high-value designer materials and surfaces for your manufacturing process.
Select the surface chemistry of your material from a range of design and
customization options.
See how you can experience the Benefits of APPLD and
realize the opportunities.
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